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Volumn 469, Issue 1-2, 2009, Pages 478-482
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Preparation of copper selenide thin films by simple chemical route at low temperature and their characterization
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Author keywords
Chemical synthesis; Grain boundaries; Semiconductor; Thin films; X ray diffraction
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Indexed keywords
ABSORPTION;
COLOR FILMS;
COPPER;
CRYSTAL GROWTH;
DIFFRACTION;
ELECTRIC CONDUCTIVITY;
ELECTRIC POWER MEASUREMENT;
ELECTROMAGNETIC WAVE ABSORPTION;
ENERGY ABSORPTION;
FILM PREPARATION;
GRAIN BOUNDARIES;
GRAIN SIZE AND SHAPE;
LIGHT ABSORPTION;
OPTICAL CONDUCTIVITY;
OPTICAL MICROSCOPY;
SCANNING ELECTRON MICROSCOPY;
SEMICONDUCTOR INSULATOR BOUNDARIES;
SEMICONDUCTOR MATERIALS;
SODIUM;
SOLIDS;
SYNTHESIS (CHEMICAL);
THIN FILMS;
X RAY ANALYSIS;
X RAY DIFFRACTION;
X RAY DIFFRACTION ANALYSIS;
ALKALINE MEDIUMS;
CHEMICAL ROUTES;
CHEMICAL SYNTHESIS;
COPPER SELENIDE;
COPPER SULPHATE;
ELECTRIC POWERS;
ELECTRICAL CONDUCTIVITIES;
ENERGY BAND GAPS;
GLASS SUBSTRATES;
LOW TEMPERATURES;
OPTICAL ABSORPTIONS;
P-TYPE CONDUCTIONS;
PRECURSOR SOLUTIONS;
SEMICONDUCTOR;
SODIUM SELENOSULPHATE;
ELECTRIC NETWORK ANALYSIS;
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EID: 58249141587
PISSN: 09258388
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jallcom.2008.02.062 Document Type: Article |
Times cited : (49)
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References (26)
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