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Volumn 469, Issue 1-2, 2009, Pages 478-482

Preparation of copper selenide thin films by simple chemical route at low temperature and their characterization

Author keywords

Chemical synthesis; Grain boundaries; Semiconductor; Thin films; X ray diffraction

Indexed keywords

ABSORPTION; COLOR FILMS; COPPER; CRYSTAL GROWTH; DIFFRACTION; ELECTRIC CONDUCTIVITY; ELECTRIC POWER MEASUREMENT; ELECTROMAGNETIC WAVE ABSORPTION; ENERGY ABSORPTION; FILM PREPARATION; GRAIN BOUNDARIES; GRAIN SIZE AND SHAPE; LIGHT ABSORPTION; OPTICAL CONDUCTIVITY; OPTICAL MICROSCOPY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR INSULATOR BOUNDARIES; SEMICONDUCTOR MATERIALS; SODIUM; SOLIDS; SYNTHESIS (CHEMICAL); THIN FILMS; X RAY ANALYSIS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

EID: 58249141587     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2008.02.062     Document Type: Article
Times cited : (49)

References (26)
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    • H. Toyaji, Y. Hiroshi, Jpn. Kokai Tokkyo Kaho JP 02 175 (1990), p. 622.
  • 5
    • 58249133274 scopus 로고    scopus 로고
    • U. Hiroto, Jpn. Tokkyo Kaho JP 01 298 (1989), p. 10.
    • U. Hiroto, Jpn. Tokkyo Kaho JP 01 298 (1989), p. 10.
  • 19
    • 58249136635 scopus 로고    scopus 로고
    • JCPDS Data File No. -00-020-1020.
    • JCPDS Data File No. -00-020-1020.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.