High frequency characteristics of soft magnetic Fe-O alloy thin films fabricated by helicon plasma sputtering

Journal of Alloys and Compounds

Volumn 469, Issue 1-2, 2009, Pages 20-23

  Peng, D L ^a   Wang, W ^a   Chen, Y ^a   Sumiyama, K ^b   Hihara, T ^b  

^a XIAMEN UNIVERSITY   (China)

^b NAGOYA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Fe O alloy film; Helicon plasma sputtering; High frequency characteristics; Soft magnetic properties

Indexed keywords

ALLOYS; GRAIN REFINEMENT; HELICONS; IRON ALLOYS; MAGNETIC ANISOTROPY; MAGNETIC MATERIALS; MAGNETIC PROPERTIES; MAGNETISM; METALLIC FILMS; OXYGEN; PLASMA DEPOSITION; PLASMA DIAGNOSTICS; PLASMAS; SATURATION MAGNETIZATION; THIN FILMS;

EFFECT OF OXYGENS; FE OXIDES; FE-O ALLOY FILM; HELICON PLASMA SPUTTERING; HIGH FREQUENCY CHARACTERISTICS; LOW DOSES; MAGNETIC COERCIVITY; MICROWAVE APPLICATIONS; ROOM TEMPERATURES; SOFT MAGNETIC; SOFT MAGNETIC PROPERTIES; UNIAXIAL MAGNETIC ANISOTROPIES;

MAGNETIC THIN FILMS;

EID: 58249130349     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2008.01.125     Document Type: Article

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