Thickness dependence of critical current density in MgB2 films fabricated by ex situ annealing of CVD-grown B films in Mg vapor

Superconductor Science and Technology

Volumn 22, Issue 1, 2009, Pages

  Hanna, Mina ^a   Wang, Shufang ^b   Redwing, Joan M ^b   Xi, X X ^b   Salama, Kamel ^a  

^a University of Houston   (United States)

^b PENNSYLVANIA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BORON; BORON COMPOUNDS; CRITICAL CURRENT DENSITY (SUPERCONDUCTIVITY); ELECTRIC CONDUCTIVITY; FABRICATION; MAGNETIC FILMS; PULSED LASER APPLICATIONS; SUPERCONDUCTING WIRE; SUPERCONDUCTIVITY; VAPORS; YTTRIUM BARIUM COPPER OXIDES;

B FILMS; BORON FILMS; COATED CONDUCTORS; CRITICAL CURRENT DENSITIES; EX-SITU; FABRICATION METHODS; HIGH QUALITIES; LOW PROCESSING TEMPERATURES; MAXIMUM VALUES; RF CAVITIES; THICKNESS DEPENDENCES;

CHEMICAL VAPOR DEPOSITION;

EID: 58149483792     PISSN: 09532048     EISSN: 13616668     Source Type: Journal    
DOI: 10.1088/0953-2048/22/1/015024     Document Type: Article

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