Effects of depositing rate on structure and magnetic properties of Mn:TiO2 films grown by plasma-assisted molecular beam epitaxy

Materials Science and Engineering: B

Volumn 156, Issue 1-3, 2009, Pages 90-93

  Li, X Y ^a   Wu, S X ^a   Xu, L M ^a   Li, C T ^b   Liu, Y J ^a   Xing, X J ^a   Li, S W ^a  

^a SUN YAT SEN UNIVERSITY   (China)

^b Guangdong Science and Technology Library (Guangdong Institute of Scientific and Technical Information and Development Strategy)   (China)

Author keywords

Anatase; Dilute magnetic semiconductors; Mn doped TiO2 film; Molecular beam epitaxy

Indexed keywords

CRYSTALLINE MATERIALS; DEFECT DENSITY; DILUTED MAGNETIC SEMICONDUCTORS; FERROMAGNETISM; MAGNETOPLASMA; MANGANESE COMPOUNDS; MOLECULAR BEAM EPITAXY; MOLECULAR BEAMS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

ANATASE TIO 2; CRYSTALLINE STRUCTURE; DEPOSITING RATE; DILUTE MAGNETIC SEMICONDUCTORS; MN-DOPED; MN-DOPED TIO2 FILM; MOLECULAR-BEAM EPITAXY; PLASMA-ASSISTED MOLECULAR BEAM EPITAXY; STRUCTURAL QUALITIES; TIO 2 FILMS;

TITANIUM DIOXIDE;

EID: 58149352249     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2008.11.036     Document Type: Article

References (27)

1. Dietl T., et al. Science 287 (2000) 1019
2. Matsumoto Y., et al. Science 291 (2001) 854
3. Wang Y.X., Liu H., Li Z.Q., Zhang X.X., Zheng R.K., and Ringer S.P. Appl. Phys. Lett. 89 (2006) 042511
4. Liu G.L., Cao Q., Deng J.X., Xing P.F., Tian Y.F., Chen Y.X., Yan S.S., and Mei L.M. Appl. Phys. Lett. 90 (2007) 052504
5. Fukumura T., Yamada Y., Toyosaki H., Hasegawa T., Koinuma H., and Kawasaki M. Appl. Surf. Sci. 223 (2004) 62
6. Chambers S.A. Surf. Sci. Rep. 61 (2006) 345-381
7. Coey J.M.D., Venkatesan M., and Fitzgerald C.B. Nat. Mater. 4 (2005) 173
8. Dinia A., Schmerber G., Mény C., Pierron-Bohnes V., and Beaurepaire E. J. Appl. Phys. 97 (2005) 123908
9. Xu J.P., Wang J.F., Lin Y.B., Liu X.C., Lu Z.L., Lu Z.H., Lv L.Y., Zhang F.M., and Du Y.W. J. Phys. D: Appl. Phys. 40 (2007) 4757
10. Barla A., Schmerber G., Beaurepaire E., Dinia A., et al. Phys. Rev. B 76 (2007) 125201
11. Belghazi Y., Schmerber G., Colis S., Rehspringer J.L., and Dinia A. Appl. Phys. Lett. 89 (2006) 122504
12. Ohno H., Shen A., Matsukura F., Oiwa A., Endo A., Katsumoto S., and Iye Y. Appl. Phys. Lett. 69 (1996) 363
13. Saito H., Zayets V., Yamagata S., and Ando K. Phys. Rev. Lett. 90 (2003) 207202
14. Hong N.H., Sakai J., Poirot N., and Briźe V. Phys. Rev. B 73 (2006) 132404
15. Kaspar T.C., Heald S.M., et al. Phys. Rev. Lett. 95 (2005) 217203
16. Kaspar T.C., Droubay T., et al. Phys. Rev. B 73 (2006) 155327
17. Li X.Y., Wu S.X., Xu L.M., Liu Y.J., Xing X.J., and Li S.W. J. Appl. Phys. 104 (2008) 093914
18. Wu S.X., Xia Y.Q., Yu X.L., Liu Y.J., and Li S.W. J. Appl. Phys. 102 (2007) 063911
19. Moudler J.F., Stickle W.F., Sobol P.E., and Bomben K.D. Handbook of X-ray Photoelectron Spectroscopy (1992), PerkinElmer, Eden Praitie, MN p. 128
20. Zhu J.F., Deng Z.G., Chen F., Zhang J.L., Chen H.J., Anpo M., Huang J.Z., and Zhang L.Z. Appl. Catal. B 62 (2006) 329
21. Kang Y.J., Kim D.S., Lee S.H., Park J., et al. J. Phys. Chem. C 111 (2007) 14956-14961
22. Banerjeea S., Mandal M., Gayathrib N., and Sardar M. Appl. Phys. Lett. 91 (2007) 182
23. Liu H., Zhang X., Li L., Wang Y.X., Gao K.H., Li Z.Q., Zheng R.K., Ringer S.P., Zhang B., and Zhang X.X. Appl. Phys. Lett. 91 (2007) 072511
24. Song C., Geng K.W., Zeng F., Wang X.B., Shen Y.X., Pan F., Xie Y.N., Liu T., Zhou H.T., and Fan Z. Phys. Rev. B 73 (2006) 024405
25. Dinia A., Schmerber G., Pierron-Bohnes V., Meny C., Panissod P., and Beaurepaire E. J. Magn. Magn. Mater. 286 (2005) 37
26. Ye L.H., et al. Phys. Rev. B 73 (2006) 081304(R)
27. Pan F., Song C., Liu X.J., Yang Y.C., and Zeng F. Mater. Sci. Eng. R 62 (2008) 1-35