Electrodeposited porous and amorphous copper oxide film for application in supercapacitor

Materials Chemistry and Physics

Volumn 114, Issue 1, 2009, Pages 6-9

  Patake, V D ^a   Joshi, S S ^b   Lokhande, C D ^a,b   Joo, Oh Shim ^b  

^a SHIVAJI UNIVERSITY   (India)

^b Korea Institute of Science and Technology   (South Korea)

Author keywords

Amorphous; Copper oxide; Electrochemical properties; Thin films

Indexed keywords

AMORPHOUS FILMS; APPLICATIONS; CAPACITANCE; CAPACITORS; COPPER; CYCLIC VOLTAMMETRY; ELECTROCHEMICAL PROPERTIES; ELECTROLYTIC CAPACITORS; MAGNETIC FILMS; MOLECULAR BEAM EPITAXY; OXIDE FILMS; SCANNING; SCANNING ELECTRON MICROSCOPY; SODIUM; STAINLESS STEEL; STRUCTURAL ANALYSIS; SUBSTRATES; THIN FILMS; X RAY ANALYSIS; X RAY DIFFRACTION ANALYSIS;

AMORPHOUS; CATHODIC ELECTRODEPOSITIONS; COPPER OXIDE FILMS; CYCLIC VOLTAMMETRIC CURVES; MORPHOLOGICAL PROPERTIES; MORPHOLOGICAL STUDIES; NEW MATERIALS; OXIDE ELECTRODES; OXIDE THIN FILMS; POTENTIAL APPLICATIONS; ROOM TEMPERATURES; SCANNING ELECTRON MICROGRAPHS; SPECIFIC CAPACITANCES; SULPHATE BATHS; SUPERCAPACITORS; X-RAY DIFFRACTIONS; XRD PATTERNS;

COPPER OXIDES;

EID: 58149299782     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2008.09.031     Document Type: Article

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