Design, preparation and characterization of 355 nm antireflection coatings

Zhongguo Jiguang/Chinese Journal of Lasers

Volumn 35, Issue 12, 2008, Pages 2026-2030

  Yu, Hua ^a,b   Cui, Yun ^a,b   Shen, Yanming ^a,b   Qi, Hongji ^a   Yi, Kui ^a   Shao, Jianda ^a   Fan, Zhengxiu ^a  

^a SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

Antireflection coatings; Laser induce damage threshold; Thermal boat evaporation; Thin films; Vacuum annealing

Indexed keywords

ANNEALING; ANTIREFLECTION COATINGS; BOATS; COATINGS; EVAPORATION; FILM PREPARATION; LASERS; MOISTURE; PULSED LASER APPLICATIONS; REFLECTION; SUBSTRATES; SYSTEM STABILITY; THERMAL EVAPORATION; THIN FILMS; VACUUM; VACUUM EVAPORATION; VAPORS;

355 NM LASERS; DAMAGE MORPHOLOGIES; ELECTRIC-FIELD; IN VACUUMS; LASER DAMAGE RESISTANCES; LASER INDUCE DAMAGE THRESHOLD; MASKING TECHNOLOGIES; SPECTRUM STABILITIES; SUBSTRATE INTERFACES; SURFACE CONDITIONS; THERMAL BOAT EVAPORATION; VACUUM ANNEALING;

REFLECTIVE COATINGS;

EID: 58149265616     PISSN: 02587025     EISSN: None     Source Type: Journal    
DOI: 10.3788/CJL20083512.2026     Document Type: Article

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