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Volumn 113, Issue 2-3, 2009, Pages 567-573
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Synthesis and optical properties of photosensitive polyimide/silica hybrid thin films
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Author keywords
Chemical synthesis; Composite materials; Lithography; Optical properties
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Indexed keywords
AGENTS;
CARBOXYLIC ACIDS;
CHEMICAL PROPERTIES;
COMPLEXATION;
COMPOSITE MATERIALS;
COMPOSITE MICROMECHANICS;
COUPLING AGENTS;
ESTERS;
FILM PREPARATION;
FILMS;
LIGHT SENSITIVE MATERIALS;
MATERIALS PROPERTIES;
OPTICAL INSTRUMENTS;
OPTICAL PROPERTIES;
ORGANIC ACIDS;
OXIDES;
PARTICLE SIZE ANALYSIS;
PHOTOELECTRON SPECTROSCOPY;
PHOTOSENSITIVITY;
POLYIMIDES;
REFRACTIVE INDEX;
SILICA;
SILICON COMPOUNDS;
SYNTHESIS (CHEMICAL);
THERMODYNAMIC PROPERTIES;
X RAY PHOTOELECTRON SPECTROSCOPY;
ACRYLIC ACIDS;
ALKOXY SILANES;
AMINO PROPYL TRIETHOXY SILANES;
CHEMICAL SYNTHESIS;
COLLOIDAL SILICAS;
CONVENTIONAL PROCESSES;
CURING PROCESSES;
ETHYL ESTERS;
HYBRID FILMS;
HYBRID THIN FILMS;
METHACRYLOXYPROPYL TRIMETHOXY SILANES;
MONODISPERSED;
OXYDIANILINE;
POTENTIAL APPLICATIONS;
SEM ANALYSES;
SILICA CONTENTS;
SILICA DOMAINS;
THERMAL PROPERTIES;
THICKNESS VARIATIONS;
TRIMETHOXYSILANE;
VOLUME SHRINKAGES;
X-RAY PHOTOELECTRON SPECTROSCOPIES;
HYBRID MATERIALS;
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EID: 58149174229
PISSN: 02540584
EISSN: None
Source Type: Journal
DOI: 10.1016/j.matchemphys.2008.08.012 Document Type: Article |
Times cited : (13)
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References (20)
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