Photolithographically manufactured acrylate polymer multimode optical waveguide loss design rules

Proceedings - 2008 2nd Electronics Systemintegration Technology Conference, ESTC

Volumn , Issue , 2008, Pages 1251-1255

  Wang, Kai ^a   Selviah, David R ^a   Papakonstantinou, Joannis ^b   Yu, Guoyu ^c   Baghsiahi, Hadi ^a   Fernández, F Anibal ^a  

^a Department of Electronic and Electrical Engineering   (United Kingdom)

^b Sharp Laboratories of Europe   (United Kingdom)

^c Optic Technium

Author keywords

[No Author keywords available]

Indexed keywords

BIT ERROR RATE; INTEGRATED OPTOELECTRONICS; OPTICAL LOSSES; OPTICAL WAVEGUIDES; PHOTORESISTS; POLYMERS; POSITION MEASUREMENT; WAVEGUIDE COMPONENTS; WAVEGUIDE COUPLERS;

ACRYLATE POLYMERS; ANGULAR ACCEPTANCES; ANGULAR DIVERGENCES; BIT ERRORS; DESIGN RULES; EXPERIMENTAL MEASUREMENTS; FABRICATION TECHNIQUES; LATERAL SIZES; MEASUREMENT TECHNIQUES; MULTIMODE OPTICAL WAVEGUIDES; MULTIMODE WAVEGUIDES; NEW TECHNIQUES; OPTICAL POWERS; OPTICAL SOURCES; OPTICAL-; PRECISE POSITIONS; ROOM TEMPERATURES; TRANSMITTED POWERS; WAVEGUIDE CROSSINGS;

WAVEGUIDES;

EID: 58149149933     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ESTC.2008.4684533     Document Type: Conference Paper

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