A proposed high-power UV industrial demonstration laser at CEBAF

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2703, Issue , 1996, Pages 6-14

  Benson, Stephen V ^a   Bisognano, Joseph J ^a   Bohn, Courtlandt L ^a   Cardman, Larry ^a   Colson, William B ^b   Davidson, Paul C ^a   Douglas, David ^a   Dylla, H Frederick ^a   Engwall, David ^c   Fugitt, Jock ^a   Goldstein, John C ^d   Jordan, Kevin ^a   Kehne, David ^a   Li, Zhenghai ^e   Liu, Hong Xiu ^a   Merminga, Lia ^a   Neil, George R ^a   Neuffer, David ^a   Shinn, Michelle D ^a   Wiseman, Mark ^a   Wong, Robert K ^b   more..

^a THOMAS JEFFERSON NATIONAL ACCELERATOR FACILITY   (United States)

^b NAVAL POSTGRADUATE SCHOOL   (United States)

^c UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^d LOS ALAMOS NATIONAL LABORATORY   (United States)

^e SLAC NATIONAL ACCELERATOR LABORATORY   (United States)

Author keywords

Free electron laser; Industrial laser; Picosecond pulses; UV laser

Indexed keywords

ELECTRON BEAMS; ELECTRON GUNS; ELECTRONS; LASERS; MACHINING; MICROELECTRONICS; PARTICLE BEAMS; POWER QUALITY; RESONATORS; SURFACE TREATMENT; ULTRASHORT PULSES;

ACCELERATOR DESIGNS; AVERAGE POWERS; CRITICAL DESIGNS; FREE-ELECTRON LASER; HIGH POWERS; INDUSTRIAL LASER; INDUSTRIAL PROCESSING; LASER LIGHTS; LASER PERFORMANCES; NEW PORTS; PICOSECOND PULSES; POWER HANDLINGS; ULTRA VIOLETS; UV LASER; VIRGINIA;

PULSED LASER APPLICATIONS;

EID: 58049154449     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.237714     Document Type: Conference Paper

References (14)

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