Surface X-ray diffraction study of the metal-insulator transition on the Si(553)-Au surface

e-Journal of Surface Science and Nanotechnology

Volumn 6, Issue , 2008, Pages 281-285

  Voegeli, Wolfgang ^a   Takayama, Toru ^a   Kubo, Kimitaka ^a   Abe, Makoto ^a   Iwasawa, Yusaku ^a   Shirasawa, Tetsuroh ^a   Takahashi, Toshio ^a   Akimoto, Koichi ^b   Sugiyama, Hiroshi ^c   Tajiri, Hiroo ^d   Sakata, Osami ^d  

^a UNIVERSITY OF TOKYO   (Japan)

^b NAGOYA UNIVERSITY   (Japan)

^c HIGH ENERGY ACCELERATOR RESEARCH ORGANIZATION KEK   (Japan)

^d JAPAN SYNCHROTRON RADIATION RESEARCH INSTITUTE   (Japan)

Author keywords

Diffraction; Gold; Metal insulator transition; Phase transition in low dimensions; Reflection; Si(553); Silicon; X ray scattering

Indexed keywords

DIFFRACTION; GOLD; MEAN FIELD THEORY; METAL INSULATOR BOUNDARIES; REFLECTION; SEMICONDUCTOR INSULATOR BOUNDARIES; SILICON; TEMPERATURE DISTRIBUTION; X RAY DIFFRACTION; X RAY SCATTERING;

DIFFRACTION INTENSITY; LOW TEMPERATURES; NEAR ROOM TEMPERATURE; PEIERLS TRANSITION; SI(553); SURFACE PLANES; SURFACE X-RAY DIFFRACTION; TEMPERATURE DEPENDENCE;

METAL INSULATOR TRANSITION;

EID: 58049130608     PISSN: None     EISSN: 13480391     Source Type: Journal    
DOI: 10.1380/ejssnt.2008.281     Document Type: Conference Paper

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