Alternating phase-shift generation for complex circuit designs

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2884, Issue , 1996, Pages 508-519

  Galan, Gerald ^a   Lalanne, Frederic P ^a   Tissier, Michel ^b   Belleville, Marc ^c  

^a ORANGE LABS   (France)

^b IBM   (France)

^c CEA LETI   (France)

Author keywords

Alternating phase shift mask; Automatic shifter arrangement; CAD; Hierarchy; Optical lithography

Indexed keywords

ELECTRIC BATTERIES; INTEGRATED CIRCUIT MANUFACTURE; LOGIC CIRCUITS; LOGIC DESIGN; NETWORKS (CIRCUITS); PHASE SHIFT; PHASE SHIFTERS; PHOTOLITHOGRAPHY; PHOTOMASKS; SWITCHING THEORY; TRANSISTORS;

ALTERNATING PHASE SHIFT MASK; AUTOMATIC SHIFTER ARRANGEMENT; CAD; HIERARCHY; OPTICAL LITHOGRAPHY;

DESIGN;

EID: 57949108117     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.262843     Document Type: Conference Paper

References (8)

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