Application of direct-write electron-beam lithography for deep-submicron fabrication

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2884, Issue , 1996, Pages 334-343

  Shy, Shyi Long ^a   Yew, Jen Y ^a   Nakamura, Kazumitsu ^a   Chang, Chun Yen ^a  

^a NATIONAL NANO DEVICE LABORATORIES   (Taiwan)

Author keywords

Chemically amplified resist; Electron beam lithography; Electron cyclotron resonance etching; Helicon wave plasma; Wafer direct write

Indexed keywords

CYCLOTRON RESONANCE; CYCLOTRONS; ELECTRIC CURRENT MEASUREMENT; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ELECTRON CYCLOTRON RESONANCE; ELECTRON GUNS; ETCHING; HELICONS; MICROMETERS; PARTICLE BEAMS; PHOTORESISTORS; PHOTORESISTS; PLASMAS; POLYSILICON; RESONANCE; THICKNESS MEASUREMENT; TUNGSTEN;

CHEMICALLY AMPLIFIED RESIST; CONTACT HOLES; DIRECT WRITINGS; ELECTRON CYCLOTRON RESONANCE ETCHING; HELICON WAVE PLASMA; HIGH RESOLUTIONS; IC FABRICATIONS; IN PROCESSING; LITHOGRAPHY PATTERNS; METAL SUBSTRATES; ON WAFERS; OPTICAL-; POLYSILICON GATES; POSITIVE RESISTS; SPACE PATTERNS; SUB MICRONS; TWO TYPES; WAFER DIRECT WRITE;

ELECTRONS;

EID: 57949104819     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.262816     Document Type: Conference Paper

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