Manufacturing Feasibility of OPC Masks for 0.25 μm Rule Devices

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2793, Issue , 1996, Pages 22-33

  Kawahira, Hiroichi ^a   Katsumata, Mikio ^a   Tsudaka, Keisuke ^a   Ogura, Akihiro ^a   Tomita, Manabu ^a   Nozawa, Satoru ^a  

^a SONY CORPORATION   (Japan)

Author keywords

Defect inspection; Defect repair; Eb proximity effect correction; Focused ion beam; Mask; Mask data; Mask defect; Optical proximity effect correction; Photomask

Indexed keywords

DEFECTS; FOCUSED ION BEAMS; ION BEAMS; MANUFACTURE; MASKS; PHOTOLITHOGRAPHY; REPAIR; X RAYS;

DEFECT INSPECTION; DEFECT REPAIR; MASK DATA; MASK DEFECTS; OPTICAL PROXIMITY EFFECT CORRECTIONS; PROXIMITY EFFECT CORRECTION;

PHOTOMASKS;

EID: 57949099148     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.245218     Document Type: Conference Paper

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