AFM-mapped, nanoscale, absorber-driven laser damage in UV high-reflector multilayers

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2714, Issue , 1996, Pages 384-394

  Papernov, Semyon ^a   Schmid, Ansgar W ^a   Anzelotti, J ^a   Smith, Douglas J ^a   Chrzan, Z Roman ^a  

^a UNIVERSITY OF ROCHESTER   (United States)

Author keywords

Atomic force microcopy; Hafnium oxide; Microstructural effects; Scandium oxide; Silica; UV high reflector

Indexed keywords

ATOMIC PHYSICS; ENERGY TRANSFER; HAFNIUM; HAFNIUM COMPOUNDS; LASER DAMAGE; OPTICAL MATERIALS; OXIDES; REFLECTION; SCANDIUM; SILICA;

ATOMIC-FORCE MICROCOPY; HAFNIUM OXIDE; MICROSTRUCTURAL EFFECTS; SCANDIUM OXIDE; UV HIGH REFLECTOR;

LASERS;

EID: 57849094578     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.240395     Document Type: Conference Paper

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