Electrochemical characteristics of osteoblast cultured Ti-Ta alloy for dental implant

Advanced Materials Research

Volumn 24-25, Issue , 2007, Pages 821-824

  Kim, Won Gi ^a   Choe, Han Cheol ^a   Ko, Yeong Mu ^a  

^a Chosun University   (South Korea)

Author keywords

Dental implant; Electrochemical characteristics; Osteoblast; Ti alloy

Indexed keywords

BINARY ALLOYS; CORROSION RESISTANCE; DENTAL ALLOYS; DENTAL PROSTHESES; ELECTROCHEMICAL CORROSION; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; OSTEOBLASTS; SCANNING ELECTRON MICROSCOPY; TANTALUM ALLOYS; TITANIUM ALLOYS; VACUUM FURNACES;

ARTIFICIAL SALIVA; ELECTROCHEMICAL BEHAVIORS; ELECTROCHEMICAL CHARACTERISTICS; ELECTROCHEMICAL METHODS; FIELD EMISSION SCANNING ELECTRON MICROSCOPES; LOW ELASTIC MODULUS; OSTEOBLAST CELLS; TI ALLOYS;

METAL IMPLANTS;

EID: 57649093229     PISSN: 10226680     EISSN: None     Source Type: Book Series    
DOI: 10.4028/0-87849-463-4.821     Document Type: Conference Paper

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