Deposition and meniscus alignment of DNA-CNT on a substrate

Journal of Colloid and Interface Science

Volumn 330, Issue 2, 2009, Pages 255-265

  Khripin, C Y ^a   Zheng, M ^b   Jagota, A ^a  

^a Lehigh University   (United States)

^b DUPONT COMPANY   (United States)

Author keywords

Alignment; Carbon nanotube; DNA; Kinetics; Meniscus; Placement; Self assembled monolayer

Indexed keywords

ADSORPTION; ALIGNMENT; DNA; ELECTRON ENERGY LEVELS; GENES; HYDROPHOBICITY; IONIC STRENGTH; NANOCOMPOSITES; NANOTUBES; NUCLEIC ACIDS; ORGANIC ACIDS; PH EFFECTS; SEMICONDUCTING SILICON COMPOUNDS; SILANES; SILICON; SILICON WAFERS; SINGLE-WALLED CARBON NANOTUBES (SWCN); SURFACE CHEMISTRY;

CONTROLLED DENSITIES; GLOBAL ALIGNMENTS; HYDROPHOBIC SURFACES; MENISCUS; PLACEMENT; SELF-ASSEMBLED MONOLAYER; SILANE MONOLAYERS; TWO STAGES;

CARBON NANOTUBES;

DNA; SILANE; SILICON; SINGLE WALLED NANOTUBE;

ADSORPTION; ARTICLE; DENSITY; DEVICE; EXPERIMENTAL STUDY; FORCE; HYBRID; HYDROPHOBICITY; IONIC STRENGTH; KINETICS; MODEL; PH; PRIORITY JOURNAL; TIME;

ADSORPTION; DNA; HYDROGEN-ION CONCENTRATION; KINETICS; NANOTUBES, CARBON; OSMOLAR CONCENTRATION; SILICON; TIME FACTORS;

EID: 57449104137     PISSN: 00219797     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcis.2008.10.073     Document Type: Article

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