Interface properties of iron oxide films

Journal of Physics D: Applied Physics

Volumn 37, Issue 19, 2004, Pages 2720-2725

  Jain, S ^a   Adeyeye, A O ^a   Chan, S Y ^b   Boothroyd, C B ^c  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b DATA STORAGE INSTITUTE   (Singapore)

^c INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ANTIFERROMAGNETIC MATERIALS; CRYSTAL STRUCTURE; ELECTRON BEAMS; ENTHALPY; INTERFACES (MATERIALS); METALLIC FILMS; PULSED LASER DEPOSITION; SILICA; SOLUTIONS; STOICHIOMETRY; SURFACE ACTIVE AGENTS; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

BUFFER LAYERS; CRYSTALLINITY; ELECTRON BEAM DEPOSITION; FILM THICKNESS;

IRON OXIDES;

EID: 5744224790     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/37/19/016     Document Type: Article

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