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Advanced Materials

Volumn 20, Issue 23, 2008, Pages 4530-4534

A new level of hierarchical structure control by use of supramolecular self-assembled dendronized block copolymers

(4) Li, Chaoxu a Schlüter, A Dieter b Zhang, Afang b Mezzenga, Raffaele a,c

a UNIVERSITY OF FRIBOURG (Switzerland)

b ETH ZURICH (Switzerland)

c NESTLÉ RESEARCH CENTER (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

BLOCK COPOLYMERS; COPOLYMERIZATION; COPOLYMERS; DENDRIMERS; ELECTRIC CONDUCTIVITY; HYDROCHLORIC ACID; LIQUID CRYSTAL POLYMERS; MATERIALS PROPERTIES; PHASE DIAGRAMS; PHOTORESISTS; POLYMERS; SURFACE ACTIVE AGENTS;

ACTIVE BLOCKS; ADVANCED MATERIALS; AQUEOUS SOLUTIONS; DENDRONIZED POLYMERS; DIBLOCK COPOLYMERS; GENERAL APPROACHES; HIERARCHICAL STRUCTURES; LINEAR BLOCK COPOLYMERS; LINEAR POLYMERS; LIPID SURFACTANTS; LIQUID CRYSTALLINE PHASE; MORPHO-LOGIES; NANO POROSITIES; PH VALUES; PHOTONIC PROPERTIES; SELF-ASSEMBLY; SIDE CHAINS; SUPRAMOLECULAR COMPLEXES; SWITCHABLE; TOPOLOGICAL COMPLEXITIES;

SUPRAMOLECULAR CHEMISTRY;

EID: 57349167961 PISSN: 09359648 EISSN: None Source Type: Journal
DOI: 10.1002/adma.200802086 Document Type: Article

Times cited : (43)

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