Elemental analysis with the helium ion microscope

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 26, Issue 6, 2008, Pages 2103-2106

  Sijbrandij, Sybren ^a   Thompson, Bill ^a   Notte, John ^a   Ward, Bill W ^a   Economou, Nicholas P ^a  

^a Carl Zeiss Vision Inc USA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONTRAST MECHANISMS; ELEMENTAL ANALYSES; HELIUM ION BEAMS; HIGH RESOLUTIONS; IMAGING CAPABILITIES; RECOIL ENERGIES; SCATTERING PROBABILITIES; SUB NANOMETERS;

ANGULAR DISTRIBUTION; HELIUM; INERT GASES; ION MICROSCOPES; PROBABILITY DISTRIBUTIONS;

IONS;

EID: 57249094113     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2993262     Document Type: Article

References (11)

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