In situ fabrication of density-controlled ZnO nanorod arrays on a flexible substrate using inductively coupled plasma etching and microwave irradiation

Journal of Physical Chemistry C

Volumn 112, Issue 46, 2008, Pages 17760-17763

  Cho, Seungho ^a   Kim, Semi ^a   Kim, Nam Hyo ^a   Lee, Ung Ju ^a   Jung, Seung Ho ^a   Oh, Eugene ^a   Lee, Kun Hong ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ANNEALING; ETCHING; INDUCTIVELY COUPLED PLASMA; IRRADIATION; MICROWAVE IRRADIATION; MICROWAVES; NANORODS; PHOSPHORIC ACID; PHOTORESISTS; PLASMA ETCHING; PLASMAS; SILICON; ZINC ALLOYS; ZINC OXIDE;

AAO MEMBRANES; ANODIC ALUMINUM OXIDE MEMBRANES; FLEXIBLE SUBSTRATES; IN-SITU; INDUCTIVELY COUPLED PLASMA ETCHINGS; INTERPORE DISTANCES; OXALIC ACIDS; PORE DENSITIES; SI SURFACES; ZNO NANOROD ARRAYS; ZNO NANORODS;

SEMICONDUCTING ZINC COMPOUNDS;

EID: 57249093787     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp808117q     Document Type: Article

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