Optimization of high order control including overlay, alignment and sampling

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6922, Issue , 2008, Pages

  Choi, Dongsub ^a   Lee, Chulseung ^b   Bang, Changjin ^b   Cho, Daehee ^b   Gil, Myunggoon ^b   Izikson, Pavel ^a   Yoon, Seugnhoon ^a   Lee, Dohwa ^a  

^a KLA TENCOR CORPORATION   (United States)

^b Hynix Semiconductor Inc   (South Korea)

Author keywords

High order alignment; High order correction; High order sampling; Overlay

Indexed keywords

CORRECTION METHOD; CRITICAL ISSUES; EXPERIMENTAL DATA; GENERAL APPROACH; HIGH ORDER; HIGH ORDER ALIGNMENT; HIGHER ORDER; LINEAR MODEL; NOVEL TECHNIQUES; OPTIMAL SAMPLING; OVERLAY; SAMPLING EFFICIENCY;

ALIGNMENT; OPTIMIZATION; SEMICONDUCTOR DEVICES; UNITS OF MEASUREMENT;

PROCESS CONTROL;

EID: 57249086756     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772274     Document Type: Conference Paper

References (3)

1. Choi, Dongsub, Jahnke Andreas, Schumacher Karl (Infineon Technology SC300, Dresden, Germany), Max Hoepfl, (Nikon Precision Europe GmbH, Langen, Germany), Overlay Improvement by Non-linear Error Correction and Nonlinear Error Control by APC, SPIE 2006.
2. Michiel Kupers, Dongsub Choi (Qimonda, Dresden, Germany), Geert Simons, Erik Wallerbos ( ASML, Veldhoven The Netherlands ), Non-linear methods for overlay control.
3. M. Adel, P. Izikson, D. Tien, C. K. Huang, J. C. Robinson & B. Eichelberger ( KLA Tencor ), The challenge of transforming from linear to high-order overlay control in advanced lithography.