Nano-structural and surface characteristics of non-stoichiometric In 2O3-x thin films

International Journal of Nanotechnology

Volumn 6, Issue 1-2, 2009, Pages 208-218

  Kiriakidis, G ^a,b,d   Suchea M ^a,b   Christoulakis, S ^b   Moschovis, K ^a,b   Kitsopoulos, T ^a,b   Stoemenos, J ^c  

^a INSTITUTE OF ELECTRONIC STRUCTURE AND LASER   (Greece)

^b UNIVERSITY OF CRETE   (Greece)

^c ARISTOTLE UNIVERSITY OF THESSALONIKI   (Greece)

^d INSTITUTE OF COMPUTER SCIENCE   (Greece)

Author keywords

AFM; Dc magnetron sputtering; Indium oxide; Sensing; Thin films; XTEM

Indexed keywords

ATOMIC FORCE MICROSCOPY; GAS SENSING ELECTRODES; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; INDIUM COMPOUNDS; MAGNETRON SPUTTERING; OXIDE FILMS;

CROSS-SECTION TRANSMISSION ELECTRON MICROSCOPIES; DC MAGNETRON SPUTTERING; DC MAGNETRON SPUTTERING TECHNIQUE; INDIUM OXIDE; SENSING; SURFACE CHARACTERISATION; SURFACE CHARACTERISTICS; XTEM;

THIN FILMS;

EID: 57149124336     PISSN: 14757435     EISSN: None     Source Type: Journal    
DOI: 10.1504/ijnt.2009.021717     Document Type: Article

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