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Applied Physics Express

Volumn 1, Issue 3, 2008, Pages 0315011-0315013

Microcrystalline Si1-xGex solar cells exhibiting enhanced infrared response with reduced absorber thickness

(6) Matsui, Takuya a Chang, Chia Wen a Takada, Tomoyuki a,b Isomura, Masao b Fujiwara, Hiroyuki a Kondo, Michio a

a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST (Japan)

b TOKAI UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE CARRIERS; GERMANIUM; PHOTOVOLTAIC CELLS; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA STABILITY; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SOLAR CELLS; SOLAR ENERGY; SOLAR EQUIPMENT; SPECTRUM ANALYSIS; SWITCHING CIRCUITS; THICK FILMS;

ABSORBER THICKNESSES; CHARGE CARRIER RECOMBINATIONS; COMPOSITION RANGES; EXCELLENT PERFORMANCES; GE CONTENTS; I LAYERS; INFRARED RESPONSES; INFRARED WAVELENGTHS; MICROCRYSTALLINE SI; SOLAR CELL PARAMETERS; SPECTRAL SENSITIVITIES;

MICROCRYSTALLINE SILICON;

EID: 57049112756 PISSN: 18820778 EISSN: 18820786 Source Type: Journal
DOI: 10.1143/APEX.1.031501 Document Type: Article

Times cited : (25)

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