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Volumn 255, Issue 5 PART 1, 2008, Pages 2259-2264
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Investigation of NO dissociation and reduction by H 2 on nanosized W 2 N surface with transient-response techniques
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Author keywords
NO dissociation; NO reduction; Surface reaction; Transient experiments; Tungsten nitride
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Indexed keywords
CATALYST POISONING;
DISSOCIATION;
HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY;
STEP RESPONSE;
SURFACE REACTIONS;
TEMPERATURE PROGRAMMED DESORPTION;
TRANSIENT ANALYSIS;
TRANSMISSION ELECTRON MICROSCOPY;
TUNGSTEN COMPOUNDS;
X RAY PHOTOELECTRON SPECTROSCOPY;
DISSOCIATION OF NO;
NO DISSOCIATION;
NO REDUCTION;
STEP RESPONSE EXPERIMENT;
TEMPERATURE PROGRAMMED REACTIONS;
TRANSIENT EXPERIMENTS;
TUNGSTEN NITRIDE;
X-RAY PHOTOELECTRONS;
REDUCTION;
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EID: 56949100400
PISSN: 01694332
EISSN: None
Source Type: Journal
DOI: 10.1016/j.apsusc.2008.07.081 Document Type: Article |
Times cited : (7)
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References (22)
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