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Volumn 255, Issue 5 PART 1, 2008, Pages 2259-2264

Investigation of NO dissociation and reduction by H 2 on nanosized W 2 N surface with transient-response techniques

Author keywords

NO dissociation; NO reduction; Surface reaction; Transient experiments; Tungsten nitride

Indexed keywords

CATALYST POISONING; DISSOCIATION; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; STEP RESPONSE; SURFACE REACTIONS; TEMPERATURE PROGRAMMED DESORPTION; TRANSIENT ANALYSIS; TRANSMISSION ELECTRON MICROSCOPY; TUNGSTEN COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 56949100400     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.07.081     Document Type: Article
Times cited : (7)

References (22)
  • 13
    • 0004025845 scopus 로고
    • Anderson J.R., and Boudart M. (Eds), Springer, New York
    • Ozaki A., and Aika K. In: Anderson J.R., and Boudart M. (Eds). Catalysis Science and Technology vol. 1 (1981), Springer, New York
    • (1981) Catalysis Science and Technology , vol.1
    • Ozaki, A.1    Aika, K.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.