Chemically deposited nanocrystalline NiO thin films for supercapacitor application

Applied Surface Science

Volumn 255, Issue 5 PART 2, 2008, Pages 2603-2607

  Patil, U M ^a   Salunkhe, R R ^a   Gurav, K V ^a   Lokhande, C D ^a  

^a SHIVAJI UNIVERSITY   (India)

Author keywords

Chemical bath deposition (CBD); Nickel oxide thin films; Optical properties; Supercapacitive behavior; Surface morphology; XRD

Indexed keywords

AMMONIA; ANNEALING; CYCLIC VOLTAMMETRY; DECOMPOSITION; DEPOSITION; ELECTROLYTES; ENERGY GAP; NANOCRYSTALS; NICKEL OXIDE; OPTICAL FILMS; OPTICAL PROPERTIES; OXIDE FILMS; POTASSIUM HYDROXIDE; SUBSTRATES; SUPERCAPACITOR; SURFACE MORPHOLOGY; THIN FILMS;

CAPACITIVE CHARACTERISTICS; CHEMICAL-BATH DEPOSITION; DEPOSITION PROCESS; NICKEL OXIDE THIN FILMS; OPTICAL CHARACTERIZATION; SPECIFIC CAPACITANCE; SUPERCAPACITIVE BEHAVIOR; SUPERCAPACITOR APPLICATION;

FILM PREPARATION;

EID: 56949100003     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.07.192     Document Type: Article

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