α-Ni(OH)2 thin films fabricated by liquid phase deposition method

Thin Solid Films

Volumn 517, Issue 5, 2009, Pages 1546-1554

  Deki, Shigehito ^a   Hosokawa, Akinobu ^a   Béléké, Alexis Bienvenu ^a   Mizuhata, Minoru ^a  

^a KOBE UNIVERSITY   (Japan)

Author keywords

Direct deposition; Liquid phase deposition; Morphology; Nickel hydroxide; Nickel oxide; Scanning electron microscopy; Thin films cathode; X ray diffraction

Indexed keywords

ACIDS; BORIDE COATINGS; CALCINATION; COLOR FILMS; DEPOSITION; DIFFRACTION; INORGANIC ACIDS; NICKEL; NICKEL ALLOYS; NICKEL OXIDE; OPTICAL PROPERTIES; OXIDE FILMS; PHOTOELECTRON SPECTROSCOPY; PRECIPITATION (CHEMICAL); SCANNING; SCANNING ELECTRON MICROSCOPY; SOLIDS; THICK FILMS; THIN FILMS; TRANSPARENCY; X RAY ANALYSIS; X RAY DIFFRACTION;

AQUEOUS SOLUTIONS; BORIC ACIDS; DEPOSITED FILMS; DEPOSITION PROCESSES; DIRECT DEPOSITION; DIRECT DEPOSITIONS; FLUORO COMPLEXES; HETEROGENEOUS NUCLEATIONS; INITIAL CONCENTRATIONS; INTERFERENCE COLORS; LIQUID PHASE; LIQUID PHASE DEPOSITION; NI METALS; NICKEL HYDROXIDE; REACTION TIMES; SCANNING ELECTRON MICROSCOPES; SEM IMAGES; X-RAY DIFFRACTIONS; X-RAY PHOTOELECTRON SPECTROSCOPIES;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 56949090106     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.09.040     Document Type: Article

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