Characterization of anodic films formed on copper in 0.1 M borax solution

Journal of Electroanalytical Chemistry

Volumn 624, Issue 1-2, 2008, Pages 262-268

  Ribotta, S B ^a   La orgia, L F ^a   Gassa, L M ^b   Folquer, M E ^a  

^a UNIVERSIDAD NACIONAL DE TUCUMÁN   (Argentina)

^b INSTITUTO DE INVESTIGACIONES FISICOQUÍMICAS TEÓRICAS Y APLICADAS INIFTA   (Argentina)

Author keywords

Borax solution; Copper; Electrochemical impedance spectroscopy; Oxide films; SEM; Voltammetry

Indexed keywords

BORATE MINERALS; COPPER; COPPER OXIDES; ELECTROCHEMICAL CORROSION; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; MICROSCOPIC EXAMINATION; SECONDARY EMISSION;

ANODIC FILMS; BORAX SOLUTION; COPPER OXIDE LAYERS; ELECTROCHEMICAL IMPEDANCES; EXPERIMENTAL CONDITIONS; LAYER FORMATIONS; OPEN CIRCUIT POTENTIALS; OXIDE THICKNESSES; SEM;

OXIDE FILMS;

EID: 56949088877     PISSN: 15726657     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jelechem.2008.09.015     Document Type: Article

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