Kinetic hindrance during the surface oxidation of Cu(100)-c(10×2)-Ag

Journal of Chemical Physics

Volumn 129, Issue 19, 2008, Pages

  Lahtonen, K ^a   Lampimaki M ^a   Hirsimaki M ^a   Valden, M ^a  

^a TAMPERE UNIVERSITY OF TECHNOLOGY   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; AGGLOMERATION; CHEMICAL OXYGEN DEMAND; FILM GROWTH; GAS ADSORPTION; MICROSCOPIC EXAMINATION; NANOCRYSTALLINE MATERIALS; NANOSTRUCTURED MATERIALS; NANOSTRUCTURES; OXIDATION; OXYGEN; PHOTOELECTRON SPECTROSCOPY; SCANNING TUNNELING MICROSCOPY; SILVER; SURFACE DIFFUSION; SURFACE SEGREGATION; X RAY PHOTOELECTRON SPECTROSCOPY;

AG SURFACES; CU DIFFUSIONS; CU(100); KINETIC CONTROLS; KINETIC HINDRANCES; NUCLEATION AND GROWTHS; O2 EXPOSURES; OXYGEN ADSORPTIONS; OXYGEN EXPOSURES; SURFACE OXIDATIONS; X-RAY PHOTOELECTRON SPECTROSCOPIES;

COPPER;

EID: 56849131585     PISSN: 00219606     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3020351     Document Type: Article

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