Thickness inhomogenities in the organometallic chemical vapor deposition of GaP

Applied Physics Letters

Volumn 93, Issue 20, 2008, Pages

  Liu, X ^a   Aspnes, D E ^a  

^a NORTH CAROLINA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CATALYSIS; CHEMICAL REACTIVITY; CHEMICAL VAPOR DEPOSITION; DESORPTION; EPITAXIAL GROWTH; MOLYBDENUM; ORGANOMETALLICS; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR QUANTUM DOTS; SILICON; SILICON WAFERS; VAPORS;

GAS PHASE; HETEROGENEOUS CATALYSES; INHOMOGENITIES; ORGANOMETALLIC CHEMICAL VAPOR DEPOSITIONS; POLYCRYSTAL LINES; SI SURFACES; SUSCEPTOR; THICKNESS VARIATIONS;

GALLIUM ALLOYS;

EID: 56849111192     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3029742     Document Type: Article

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