An efficient new job release control methodology

International Journal of Production Research

Volumn 47, Issue 3, 2009, Pages 703-731

  Qi, Chao ^a   Sivakumar, Appa Iyer ^b   Gershwin, Stanley B ^c  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^c Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

Job release control; Markov process model; Semiconductor wafer fabrication; Simulation; WIPLOAD control

Indexed keywords

ELECTRIC CONDUCTIVITY; FABRICATION; MARKOV PROCESSES; PROCESS MONITORING; SEMICONDUCTOR MATERIALS;

CASE STUDIES; CONGESTION LEVELS; CYCLE TIMES; JOB RELEASE CONTROL; JOB RELEASE CONTROLS; PROCESSING TIMES; SEMICONDUCTOR MANUFACTURING; SEMICONDUCTOR WAFER FABRICATION; SEMICONDUCTOR WAFER FABRICATION SYSTEMS; SHOP FLOORS; SIMULATION; SIMULATION EXPERIMENTS; STANDARD DEVIATIONS; STOCHASTIC FACTORS; SYSTEM WORKLOADS; TRANSFER LINES; WAFER FABRICATIONS; WIPLOAD CONTROL; WIPLOAD CONTROLS;

PROCESS CONTROL;

EID: 56749170897     PISSN: 00207543     EISSN: 1366588X     Source Type: Journal    
DOI: 10.1080/00207540701455335     Document Type: Article

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