SCOPUS 정보 검색 플랫폼

Lab on a Chip

Volumn 8, Issue 12, 2008, Pages 2157-2160

Photoreactive coating for high-contrast spatial patterning of microfluidic device wettability

(6) Abate, Adam R a Krummel, Amber T a Lee, Daeyeon a Marquez, Manuel b,c Holtze, Christian d Weitz, David A a

a HARVARD UNIVERSITY (United States)

b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY (United States)

c ARIZONA STATE UNIVERSITY (United States)

d BASF (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DIMETICONE; METHYLTRIETHOXYSILANE; POLYACRYLIC ACID; SILANE DERIVATIVE; TETRAETHOXYSILANE; UNCLASSIFIED DRUG;

ARTICLE; DEVICE; MICROFLUIDICS; PHOTOREACTIVITY; POLYMERIZATION; PRIORITY JOURNAL; ULTRAVIOLET RADIATION; WETTABILITY; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 56549128462 PISSN: 14730197 EISSN: 14730189 Source Type: Journal
DOI: 10.1039/b813405g Document Type: Article

Times cited : (114)

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