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Volumn 255, Issue 4, 2008, Pages 1331-1333

Depth distribution of Cs implanted into Si at steady-state during dual beam ToF-SIMS profiling

Author keywords

Cesium; Depth profiling; Dynamic TRIM; Silicon

Indexed keywords

CESIUM; ION IMPLANTATION; SECONDARY ION MASS SPECTROMETRY; SILICON; SURFACE SEGREGATION;

EID: 56449119546     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.05.260     Document Type: Article
Times cited : (4)

References (15)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.