Ferromagnetism analysis of Mn-doped CuO thin films

Journal of Physics Condensed Matter

Volumn 20, Issue 42, 2008, Pages

  Zhao, F ^a   Qiu, H M ^a   Pan, L Q ^a   Zhu, H ^b   Zhang, Y P ^a,b   Guo, Z G ^a   Yin, J H ^a   Zhao, X D ^a   Xiao, John Q ^b  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING   (China)

^b UNIVERSITY OF DELAWARE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AGGLOMERATION; ANTIFERROMAGNETISM; COPPER OXIDES; FERROMAGNETISM; FLOW INTERACTIONS; MAGNETRON SPUTTERING; MANGANESE ALLOYS; MANGANESE COMPOUNDS; RIETVELD METHOD; RIETVELD REFINEMENT; SEMICONDUCTING SILICON COMPOUNDS; SILICON; THICK FILMS; THIN FILMS;

CATION VACANCIES; CHAIN MODELS; COMPOSITION RANGES; CU IONS; ELECTRICAL CONDUCTIONS; FERROMAGNETIC BEHAVIORS; OXIDIZED SILICON SUBSTRATES; X-RAY DIFFRACTIONS;

MANGANESE;

EID: 56449098239     PISSN: 09538984     EISSN: 1361648X     Source Type: Journal    
DOI: 10.1088/0953-8984/20/42/425208     Document Type: Article

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