Furnaces evolving to meet diverse thermal processing needs

Semiconductor International

Volumn 20, Issue 3, 1997, Pages 84-88

  Singer, Peter ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

EID: 5644261270     PISSN: 01633767     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (6)

1. P. Singer, "Advances in Diffusion Furnace Technology," Semiconductor International, May 1985, p. 276.
2. P. Singer, "Trends in Vertical Diffusion Furnaces," Semiconductor International, April 1986, p. 56.
3. P. Burggraaf, "Verticals: Leading Edge Furnace Technology," Semiconductor International, Sept. 1993, p.46.
4. C. Lee and G. Noblitt, "Next Generation Challenges to Thermal Processing," Semiconductor International, March 1996, p. 73.
5. W. Weng and R. Leachman, "An Improved Methodology for Real-Time Production Decisions at Batch-Process Work Stations," IEEE Trans. on Semiconductor Manufacturing, Vol. 6, No. 3., Aug. 1993, p. 219.
6. J. Kowalski, "Small Batch Thermal Processing," 3rd International Rapid Thermal Processing Conf., 1995, p. 329.