Transport and magnetic properties of Fe3 Si epitaxial films

Journal of Applied Physics

Volumn 104, Issue 9, 2008, Pages

  Vinzelberg, H ^a   Schumann, J ^a   Elefant, D ^a   Arushanov, E ^a,b   Schmidt, O G ^a  

^a IFW DRESDEN   (Germany)

^b INSTITUTE OF APPLIED PHYSICS   (Moldova)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC RESISTANCE; EPITAXIAL GROWTH; GALLIUM ALLOYS; MAGNETIC FIELD EFFECTS; MAGNETIC FIELD MEASUREMENT; MAGNETIC FIELDS; MAGNETIC MATERIALS; MAGNETIC MOMENTS; MAGNETIC PROPERTIES; MAGNETISM; MAGNETOELECTRONICS; MAGNETORESISTANCE; MAGNETS; MOLECULAR BEAM EPITAXY; SEMICONDUCTING SILICON COMPOUNDS; SILICON; STRONTIUM COMPOUNDS; VACUUM; VACUUM EVAPORATION;

ABSOLUTE VALUES; ANISOTROPIC MAGNETORESISTANCES; BEAM EVAPORATIONS; EPITAXIALLY GROWN; FIELD STRENGTHS; GAAS SUBSTRATES; HIGH MAGNETIC FIELDS; LOW MAGNETIC FIELDS; MAGNETIZATION MEASUREMENTS; MAGNON SCATTERINGS; METALLIC MATERIALS; SI FILMS; TEMPERATURE RESISTIVITIES; TRANSPORT AND MAGNETIC PROPERTIES; TRANSVERSE MAGNETORESISTANCES; ULTRAHIGH VACUUM CHAMBERS;

EPITAXIAL FILMS;

EID: 56349132824     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3008010     Document Type: Article

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