Integration of a carbon nanotube based electrode in silicon microtechnology to fabricate electrochemical transducers

Nanotechnology

Volumn 19, Issue 43, 2008, Pages

  Luais, E ^a,b   Boujtita, M ^b   Gohier, A ^a   Tailleur, A ^a   Casimirius, S ^a   Djouadi, M A ^a   Granier, A ^a   Tessier, P Y ^a  

^a INSTITUT DES MATÉRIAUX JEAN ROUXEL   (France)

^b UNIVERSITÉ DE NANTES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS CARBON; AMORPHOUS FILMS; AMORPHOUS SILICON; BUFFER LAYERS; CYCLIC VOLTAMMETRY; CYCLOTRONS; DIAMOND FILMS; ELECTROCHEMICAL ELECTRODES; ELECTRON CYCLOTRON RESONANCE; FABRICATION; MONOCRYSTALLINE SILICON; PHYSICAL VAPOR DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILMS; YARN;

AMORPHOUS CARBON THIN FILMS; ELECTROCHEMICAL BEHAVIOUR; ELECTROCHEMICAL RESPONSE; ELECTROCHEMICAL TRANSDUCERS; ELECTRON CYCLOTRON RESONANCE PLASMA; PHYSICAL VAPOUR DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITIONS (PECVD); SILICON MICROTECHNOLOGY;

CARBON NANOTUBES;

CARBON NANOTUBE; NICKEL; SILICON;

ARTICLE; CATALYST; CYCLIC POTENTIOMETRY; ELECTROCHEMICAL ANALYSIS; ELECTRODE; FILM; NANOTECHNOLOGY; PRIORITY JOURNAL; TRANSDUCER;

EID: 56349083853     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/19/43/435502     Document Type: Article

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