Effects of background oxygen pressure on dielectric and ferroelectric properties of epitaxial (K0.44, Na0.52, Li0.04) (Nb0.84, Ta0.10, Sb0.06) O3 thin films on SrTiO3

Applied Physics Letters

Volumn 93, Issue 19, 2008, Pages

  Abazari, M ^a   Akdogan E K ^a   Safari, A ^a  

^a The State University of New Jersey   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC PROPERTIES; KETONES; LITHIUM; NIOBIUM; OXYGEN; POLARIZATION; POSITIVE IONS; PULSED LASER APPLICATIONS; PULSED LASER DEPOSITION; STRONTIUM ALLOYS; TANTALUM; THICK FILMS;

DIELECTRIC AND FERROELECTRIC PROPERTIES; DIELECTRIC CONSTANTS; ELECTRICAL PROPERTIES; MISFIT STRAINS; OXYGEN PARTIAL PRESSURES; OXYGEN PRESSURES; PULSED LASERS; SATURATED POLARIZATIONS; SITE CATIONS;

THIN FILMS;

EID: 56249112611     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3025301     Document Type: Article

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