메뉴 건너뛰기




Volumn 310, Issue 23, 2008, Pages 5093-5097

Selective-area growth of GaAs and InAs nanowires-homo- and heteroepitaxy using SiNx templates

Author keywords

A1. Nanostructures; A2. Selective area growth; A3. Metalorganic vapor phase epitaxy; B1. Nanowires

Indexed keywords

CRYSTAL GROWTH; ELECTRIC WIRE; ELECTRON BEAM LITHOGRAPHY; EPITAXIAL GROWTH; GALLIUM ALLOYS; INDIUM ARSENIDE; MICROSCOPIC EXAMINATION; NANOSTRUCTURED MATERIALS; NANOSTRUCTURES; NANOWIRES; OPTICAL DEVICES; ORGANOMETALLICS; PLASMA DEPOSITION; PLASMA DIAGNOSTICS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING GALLIUM; SEMICONDUCTING INDIUM; SILICON NITRIDE; SIMULATED ANNEALING; SUBSTRATES; VAPORS;

EID: 56249104396     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2008.06.065     Document Type: Article
Times cited : (40)

References (12)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.