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Volumn 310, Issue 23, 2008, Pages 5093-5097
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Selective-area growth of GaAs and InAs nanowires-homo- and heteroepitaxy using SiNx templates
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Author keywords
A1. Nanostructures; A2. Selective area growth; A3. Metalorganic vapor phase epitaxy; B1. Nanowires
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Indexed keywords
CRYSTAL GROWTH;
ELECTRIC WIRE;
ELECTRON BEAM LITHOGRAPHY;
EPITAXIAL GROWTH;
GALLIUM ALLOYS;
INDIUM ARSENIDE;
MICROSCOPIC EXAMINATION;
NANOSTRUCTURED MATERIALS;
NANOSTRUCTURES;
NANOWIRES;
OPTICAL DEVICES;
ORGANOMETALLICS;
PLASMA DEPOSITION;
PLASMA DIAGNOSTICS;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SEMICONDUCTING GALLIUM;
SEMICONDUCTING INDIUM;
SILICON NITRIDE;
SIMULATED ANNEALING;
SUBSTRATES;
VAPORS;
A1. NANOSTRUCTURES;
A2. SELECTIVE-AREA GROWTH;
A3. METALORGANIC VAPOR PHASE EPITAXY;
B1. NANOWIRES;
CIRCULAR OPENINGS;
FREE GROWTHS;
GAAS SUBSTRATES;
GROWTH BEHAVIORS;
GROWTH CONDITIONS;
GROWTH DIRECTIONS;
GROWTH PARAMETERS;
HETERO EPITAXIES;
METAL ORGANIC VAPOR-PHASE EPITAXIES;
MOVPE GROWTHS;
RADIAL HETEROSTRUCTURES;
SUBSTRATE SURFACES;
TRANSMISSION ELECTRONS;
TRIANGULAR LATTICES;
UNIFORM ARRAYS;
V/III RATIOS;
WET CHEMICALS;
METALLORGANIC VAPOR PHASE EPITAXY;
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EID: 56249104396
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jcrysgro.2008.06.065 Document Type: Article |
Times cited : (40)
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References (12)
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