Room temperature detachment nanolithography using a rigiflex polymeric mold

Journal of Nanoscience and Nanotechnology

Volumn 8, Issue 7, 2008, Pages 3621-3625

  Kim, Jae Kwan ^a   Sun, Kahp Y ^a  

^a Seoul National University   (South Korea)

Author keywords

Detachment; Mold; Nanolithography; Room temperature

Indexed keywords

COHESIVE FORCES; DETACHMENT; FILM SURFACES; FOURIER TRANSFORM INFRARED; GOLD SUBSTRATES; LOW PRESSURES; NANOPATTERNS; ORGANIC FILMS; ORGANIC THIN FILMS; POLYURETHANE ACRYLATES; RESIDUAL LAYERS; ROOM TEMPERATURE; ROOM TEMPERATURES; ULTRAVIOLET EXPOSURES; UV EXPOSURES; WORK OF ADHESIONS;

ABS RESINS; AMINES; CONTACT ANGLE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FOURIER TRANSFORMS; HYDROCARBONS; INFRARED SPECTROSCOPY; MOLDS; ORGANIC COMPOUNDS; POLYMERS; SEMICONDUCTING SILICON COMPOUNDS; SILICON; THICK FILMS; WATER POLLUTION;

NANOLITHOGRAPHY;

4,4' BIS(N 1 NAPTHYL N PHENYL AMINO)BIPHENYL; 4,4'-BIS(N-1-NAPTHYL-N-PHENYL-AMINO)BIPHENYL; BIPHENYL DERIVATIVE; GOLD; NANOPARTICLE; NAPHTHALENE DERIVATIVE; ORGANIC COMPOUND; POLYMER; POLYURETHAN; SILICON; UNCLASSIFIED DRUG;

ADHESION; ARTICLE; CHEMISTRY; EQUIPMENT DESIGN; INFRARED SPECTROSCOPY; METHODOLOGY; NANOTECHNOLOGY; SURFACE PROPERTY; TEMPERATURE; ULTRAVIOLET RADIATION;

ADHESIVENESS; BIPHENYL COMPOUNDS; EQUIPMENT DESIGN; GOLD; NANOPARTICLES; NANOTECHNOLOGY; NAPHTHALENES; ORGANIC CHEMICALS; POLYMERS; POLYURETHANES; SILICON; SPECTROSCOPY, FOURIER TRANSFORM INFRARED; SURFACE PROPERTIES; TEMPERATURE; ULTRAVIOLET RAYS;

EID: 55849115694     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2008.162     Document Type: Article

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