Nanoimprint lithography of topology optimized photonic crystal devices

Conference on Lasers and Electro-Optics and 2006 Quantum Electronics and Laser Science Conference, CLEO/QELS 2006

Volumn , Issue , 2006, Pages

  Bilenberg, Brian ^a   Frandsen, Lars Hagedorn ^a   Nielsen, Theodor ^a   Vogler, Marko ^b   Borel, Peter Ingo ^a   Kristensen, Anders ^a  

^a TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

^b MICRO RESIST TECHNOLOGY GMBH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL ATOMIC STRUCTURE; ELECTRON OPTICS; NANOIMPRINT LITHOGRAPHY; PHOTONIC CRYSTALS; POWDERS; QUANTUM ELECTRONICS;

FABRICATION OF PHOTONIC CRYSTALS; NANOIMPRINT PROCESSES; PATTERN REPLICATIONS; PHOTONIC CRYSTAL DEVICES;

LASERS;

EID: 55649106612     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/CLEO.2006.4628228     Document Type: Conference Paper

References (4)

1. P. I. Borel, L. H. Frandsen, A. Harpoth, M. Kristensen, J. S. Jensen, and O. Sigmund, "Topology optimised broadband photonic crystal Y-splitter", Electronics Letters 41, 69-71 (2005).
2. TEBN-1 by Tokuyama Corp., Tokyo, Japan www.tokuyama.co.jp
3. B. Bilenberg, S. Jacobsen, M. S. Schmidt, L. H. D. Skjolding, P. Shi, P. Baggild, J. O. Tegenfeldt, and A. Kristensen, "High Resolution 100 kV Electron Beam Lithography in SU-8", J. Microelectronic Engineering, accepted for publication (2005)
4. T. Nielsen, D. Nilsson, F. Bundgaard, P. Shi, P. Szabo, O. Geschke, and A. Kristensen, "Nanoimprint lithography in the cyclic olefin copolymer, Topas, a highly UV-transparent and chemically resistant thermoplast", J. Vac. Sci. Technol. B 22, 1770-1775 (2004).