Single-shot and multishot laser induced damage of HfO2/SiO 2 multilayer at YAG third harmonic

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5273, Issue , 2004, Pages 23-29

  Zhao, Yuanan ^a   Tang, Zhaosheng ^a   Shao, Jianda ^a   Fan, Zhengxiu ^a  

^a SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

Author keywords

Accumulation effect; Hfo2 sio2 dielectric mirror coatings, single shot; Impurity; Multishot, laser induced damage threshold; Structural defects

Indexed keywords

HAFNIUM COMPOUNDS; IMPURITIES; MASS SPECTROMETERS; OPTICAL COATINGS; OPTICAL MULTILAYERS; SILICA; X RAY PHOTOELECTRON SPECTROSCOPY; ZIRCONIUM;

ACCUMULATION EFFECTS; HFO2/SIO2 DIELECTRIC MIRROR COATINGS; LASER-INDUCED DAMAGE THRESHOLD; MULTISHOT; SINGLE-SHOT; STRUCTURAL DEFECTS;

LASER DAMAGE;

EID: 5544294803     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.522783     Document Type: Conference Paper

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