Growth of laser initiated damage in fused silica at 527 nm

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5273, Issue , 2004, Pages 236-243

  Norton, Mary A ^a   Donohue, Eugene E ^a   Hollingsworth, William G ^a   McElroy, James N ^a   Hackel, Richard P ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

Laser damage; Laser damage growth; Laser damage growth threshold; UV fused silica

Indexed keywords

LASER DAMAGE GROWTH; LASER DAMAGE GROWTH THRESHOLD; LASER INITIATED DAMAGE SITES; UV FUSED SILICA;

AIR; ELECTROMAGNETIC WAVE DIFFRACTION; LASER DAMAGE; LASER OPTICS; SURFACE PROPERTIES; ULTRAVIOLET RADIATION; VACUUM APPLICATIONS;

FUSED SILICA;

EID: 5544258525     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.528378     Document Type: Conference Paper

References (2)

1. C. B. Dane, L. E. Zapata. W. A. Neuman, M. A. Norton, and L. A. Hackel, "Design and operation of a 150 W near diffraction-limited laser amplifier with SBS wavefront correction," IEEE J. Quantum Electronics, 31, pp. 148-163, 1995.
2. M. A. Norton, L. W. Hrubesh, Z. Wu, E. E. Donohue, M. D. Feit, M. R. Kozlowski, D. Milam, K. P. Neeb, W. A. Molander, A. M. Rubenchik, W. D. Sell, P. J. Wegner, "Growth of laser-initiated damage in fused silica at 351 nm.Proceed. SPIE, 4347, p. 468, 2000.