Calculation of etching profile in the photolithographic process on As2S3 thin films

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 3, 1996, Pages 1864-1866

  Mamedov, S ^a   Kisliuk, A ^b  

^a ST PETERSBURG STATE UNIVERSITY   (Russian Federation)

^b FREIE UNIVERSITÄT BERLIN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 5544258351     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588568     Document Type: Article

References (9)

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