Femtosecond pulse damage behavior of oxide dielectric thin films

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5273, Issue , 2004, Pages 8-16

  Mero, Mark ^a   Liu, Jianhua ^b   Zeller, Joachim ^a   Rudolph, W ^a   Starke, Kai ^c   Ristau, Detlev ^c  

^a UNIVERSITY OF NEW MEXICO   (United States)

^b FUDAN UNIVERSITY   (China)

^c LASER ZENTRUM HANNOVER E V   (Germany)

Author keywords

Laser induced breakdown; Strong field ionization; Ultrafast processes in condensed matter

Indexed keywords

CARRIER CONCENTRATION; ENERGY TRANSFER; INTEGRATION; LASER PULSES; PHOTOIONIZATION; THIN FILMS; TITANIUM DIOXIDE;

LASER MACHINING; LASER-INDUCED BREAKDOWN; STRONG FIELD IONIZATION; ULTRAFAST PROCESSES IN CONDENSED MATTER;

DIELECTRIC FILMS;

EID: 5544226777     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.524571     Document Type: Conference Paper

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