Comparison of masking materials for high microwave power CH4/H2/Ar etching of III-V semiconductors

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 3, 1996, Pages 1752-1757

  Lee, J W ^a   Crockett, R V ^a   Pearton, S J ^a  

^a UNIVERSITY OF FLORIDA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 5544221247     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588552     Document Type: Review

References (18)

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