Preparation and characterization of thallium(I) doped molybdenum heteropolyoxometalate semiconducting thin films

Materials Chemistry and Physics

Volumn 112, Issue 1, 2008, Pages 74-77

  Mane, S R ^a   Patil, N S ^b   Sargar, A M ^b   Bhosale, P N ^b  

^a KE Society's KRP Kanya Mahavidyalaya ^*  (India)

^b SHIVAJI UNIVERSITY   (India)

Author keywords

Chemical synthesis; Optical properties; Thermoelectric power; Thin films

Indexed keywords

CHARACTERIZATION; DEPOSITION; ELECTRIC CONDUCTIVITY; ENERGY GAP; INTERCALATION; IODINE; MOLYBDENUM; OPTICAL PROPERTIES; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING FILMS; SYNTHESIS (CHEMICAL); THALLIUM; THERMOELECTRIC POWER; THIN FILMS; ULTRAVIOLET VISIBLE SPECTROSCOPY;

CHEMICAL BATH DEPOSITION TECHNIQUE; COMPOSITIONAL ANALYSIS; COMPOSITIONAL PROPERTIES; DC ELECTRICAL RESISTIVITIES; P TYPE SEMICONDUCTOR; SEMICONDUCTING MATERIALS; SEMICONDUCTING THIN FILMS; UV-VIS SPECTROSCOPY;

FILM PREPARATION;

EID: 55349143162     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2008.05.015     Document Type: Article

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