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Volumn 517, Issue 2, 2008, Pages 704-708
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Optical and structural properties of Ge films from ion-assisted deposition
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Author keywords
Germanium; Ion assisted deposition; Optical properties; Structural properties
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Indexed keywords
CORUNDUM;
CRYSTALLINE MATERIALS;
CRYSTALLITES;
GERMANIUM;
ION BEAM ASSISTED DEPOSITION;
IONS;
MICROSCOPIC EXAMINATION;
MOLECULAR BEAM EPITAXY;
NANOCRYSTALLINE ALLOYS;
OPTICAL MATERIALS;
OPTICAL PROPERTIES;
REFRACTIVE INDEX;
SEMICONDUCTING SILICON COMPOUNDS;
SILICON;
SILICON WAFERS;
THICK FILMS;
THIN FILMS;
X RAY DIFFRACTION;
ASSISTED DEPOSITIONS;
AVERAGE SIZES;
CRYSTALLINE STRUCTURES;
GE FILMS;
GE WAFERS;
GREAT-ER;
HIGHER INDICES;
OPTICAL;
POWER DENSITIES;
SILICON SUBSTRATES;
SYSTEMATIC CHANGES;
TRANSMISSION ELECTRON MICROSCOPY IMAGES;
X-RAY DIFFRACTIONS;
STRUCTURAL PROPERTIES;
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EID: 55049138262
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2008.08.112 Document Type: Article |
Times cited : (7)
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References (19)
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