Alignment of lamellar block copolymers via electrohydrodynamic-driven micropatterning

Advanced Materials

Volumn 20, Issue 16, 2008, Pages 3022-3027

  Voicu, Nicoleta E ^a,b,c   Ludwigs, Sabine ^a,b,d   Steiner, Ullrich ^a,b  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^c UNIVERSITY OF GRONINGEN   (Netherlands)

^d UNIVERSITY OF FREIBURG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ABS RESINS; BLOCK COPOLYMERS; CONCENTRATION (PROCESS); COPOLYMERIZATION; COPOLYMERS; ELECTRIC FIELDS; ELECTROHYDRODYNAMICS; ESTERS; FLUID DYNAMICS; HYDRODYNAMICS; OPTICAL MICROSCOPY; ORGANIC POLYMERS; PLASTIC PRODUCTS; POLYMER FILMS; POLYSTYRENES; STRUCTURAL DYNAMICS; SURFACE CHEMISTRY; SURFACE TENSION; THICKNESS MEASUREMENT; TOLUENE;

ATOMIC FORCES; BLOCK COPOLYMERS FILMS; COPOLYMER CONCENTRATIONS; COPOLYMER FILMS; ELECTRIC-FIELD; ELECTROSTATIC; MICROPATTERNING; MICROPHASE MORPHOLOGIES; MORPHO-LOGIES; POLY(METHYL METHACRYLATE); POLYMER CONFORMATIONS; STRUCTURAL CONTROLS; STRUCTURE FORMATIONS; TAPPING MODES; TOLUENE SOLUTIONS;

POLYMERS;

EID: 54949135242     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200702970     Document Type: Article

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