Potentials of plasma technologies in photonics;Anwendungsaspekte des Plasmas in den Optischen Technologien

Vakuum in Forschung und Praxis

Volumn 20, Issue 4, 2008, Pages 39-42

  Kaiser, Norbert ^a   Oehr, Christian ^b   Weltmann, Klaus Dieter ^c  

^a FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

^b INP GREIFSWALD   (Germany)

^c FRAUNHOFER INSTITUTE FOR INTERFACIAL ENGINEERING AND BIOTECHNOLOGY IGB   (Germany)

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EID: 54949107866     PISSN: 0947076X     EISSN: None     Source Type: Journal    
DOI: 10.1002/vipr.200800353     Document Type: Article

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