Wet etching of Gallium Indium Zinc Oxide (GIZO) semiconductor for thin film transistor application

Digest of Technical Papers - SID International Symposium

Volumn 39, Issue 1, 2008, Pages 1439-1441

  Seo, Jong Hyun ^a   Lee, Sang Hyuk ^a   Seo, Bo Hyun ^a   Jeon, Jae Hong ^a   Choe, HeeHwan ^a   Lee, Kang Woong ^a  

^a Hankuk Aviation University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; GALLIUM COMPOUNDS; II-VI SEMICONDUCTORS; OXIDE SEMICONDUCTORS; SEMICONDUCTING INDIUM; THIN FILM CIRCUITS; THIN FILMS; WET ETCHING; ZINC OXIDE;

AMORPHOUS SI; ETCHING SOLUTIONS; GALLIUM INDIUM ZINC OXIDES; RF MAGNETRONS; SEMICONDUCTOR LAYERS;

THIN FILM TRANSISTORS;

EID: 54549106634     PISSN: 0097966X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1889/1.3069421     Document Type: Conference Paper

References (4)

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3. J. H. Seo, J. Korean Phys. Soc. 50, 1193 (2007)
4. B. H. Seo et al. IMID 2007.